A Transmission Electron-Microscopy Study of RF-Magnetron-Sputtered and DC-Magnetron-Sputtered Thin-Film Chromium and Chromium Platinum Coatings
نویسندگان
چکیده
Microstructural features of sputtered chromium and chromium-50 wt. % platinum thin films on carbon substrates are presented. Films produced by rf sputtering and dc magnetron sputtering are compared using analytical electron microscopy techniques. All rf-sputtered films are uniform in chemistry and thickness and are amorphous. The chromium film became crystalline with a grain size ofless than 100 A after a 320°C heat treatment for 1 h. The chromium-50 wt. % platinum film remained amorphous after the same heat treatment. The as-sputtered dc magnetron chromium film was crystalline.
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